JPH0548307B2 - - Google Patents

Info

Publication number
JPH0548307B2
JPH0548307B2 JP60286055A JP28605585A JPH0548307B2 JP H0548307 B2 JPH0548307 B2 JP H0548307B2 JP 60286055 A JP60286055 A JP 60286055A JP 28605585 A JP28605585 A JP 28605585A JP H0548307 B2 JPH0548307 B2 JP H0548307B2
Authority
JP
Japan
Prior art keywords
manifold
face plate
reaction products
temperature
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60286055A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62146265A (ja
Inventor
Kazufumi Ogawa
Yoshiko Mino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP28605585A priority Critical patent/JPS62146265A/ja
Publication of JPS62146265A publication Critical patent/JPS62146265A/ja
Publication of JPH0548307B2 publication Critical patent/JPH0548307B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP28605585A 1985-12-19 1985-12-19 気相化学蒸着装置 Granted JPS62146265A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28605585A JPS62146265A (ja) 1985-12-19 1985-12-19 気相化学蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28605585A JPS62146265A (ja) 1985-12-19 1985-12-19 気相化学蒸着装置

Publications (2)

Publication Number Publication Date
JPS62146265A JPS62146265A (ja) 1987-06-30
JPH0548307B2 true JPH0548307B2 (en]) 1993-07-21

Family

ID=17699371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28605585A Granted JPS62146265A (ja) 1985-12-19 1985-12-19 気相化学蒸着装置

Country Status (1)

Country Link
JP (1) JPS62146265A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2572244B2 (ja) * 1987-12-01 1997-01-16 東芝セラミックス株式会社 ウェーハ熱処理用治具
US5221201A (en) * 1990-07-27 1993-06-22 Tokyo Electron Sagami Limited Vertical heat treatment apparatus
JP2628264B2 (ja) * 1992-11-30 1997-07-09 日本エー・エス・エム株式会社 熱処理装置
US6585823B1 (en) * 2000-07-07 2003-07-01 Asm International, N.V. Atomic layer deposition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4871783A (en]) * 1971-12-29 1973-09-28
JPS54160172A (en) * 1978-06-09 1979-12-18 Hitachi Ltd Manufacture of semiconductor device and cvd device used for the said manufacture
JPS59151419A (ja) * 1983-02-18 1984-08-29 Hitachi Electronics Eng Co Ltd 反応処理装置

Also Published As

Publication number Publication date
JPS62146265A (ja) 1987-06-30

Similar Documents

Publication Publication Date Title
US6103014A (en) Chemical vapor deposition chamber
US6117244A (en) Deposition resistant lining for CVD chamber
JP3624628B2 (ja) 成膜方法及び成膜装置
JPH06244123A (ja) 改良された排出システムを有する単一基板式の真空処理装置
JP2002280378A (ja) バッチ式リモートプラズマ処理装置
US5916370A (en) Semiconductor processing chamber having diamond coated components
KR920010728B1 (ko) 반도체 제조장치
JP3162955B2 (ja) プラズマ処理装置
JPH0548307B2 (en])
JPH07142408A (ja) 基板処理装置
JP2560986B2 (ja) タングステンｃｖｄ装置
JP2990551B2 (ja) 成膜処理装置
JPH0766139A (ja) 化学気相成長装置
JPH0639709B2 (ja) プラズマｃｖｄ装置
JP4286981B2 (ja) 枚葉式熱処理装置
JPH0560256B2 (en])
JP3907546B2 (ja) 縦型熱処理装置および半導体集積回路装置の製造方法
JP3070567B2 (ja) 縦型減圧気相成長装置とこれを用いた気相成長方法
JPH0727870B2 (ja) 減圧気相成長方法
JP3056240B2 (ja) 熱処理装置
JPH01188678A (ja) プラズマ気相成長装置
JP2004289166A (ja) バッチ式リモートプラズマ処理装置
JP3029953B2 (ja) 半導体ウェーハの熱処理装置
JP2686465B2 (ja) 熱処理装置
JP3495501B2 (ja) 気相成長装置

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees